John D. DeSain
The Aerospace Corporation
El Segundo
CA 90245-4691
USA
Name/email consistency: high
- Ultraviolet photochemistry of trichlorovinylsilane and allyltrichlorosilane: vinyl radical (HCCH2) and allyl radical (H2CCHCH2) production in 193 nm photolysis. DeSain, J.D., Jusinski, L.E., Taatjes, C.A. Phys. Chem. Chem. Phys (2006)
- Reaction of chlorine atom with trichlorosilane from 296 to 473 K. DeSain, J.D., Valachovic, L., Jusinski, L.E., Taatjes, C.A. J. Chem. Phys (2006)